The Hitachi FB-2000A FIB uses a beam of focused high-energy gallium ions to remove
material in a very controlled manner.
Hitachi FB-2000A FIB
The Hitachi FB-2000A FIB uses a beam of focused high-energy (30 kV) gallium ions to
remove material in a very controlled manner from inorganic specimens. The FB-2000A
is a single beam system; that is, users image the specimen with the same beam used
for milling. The column resembles that of an electron microscope and functions very
much the same. Control of the ion beam is gained through the Unix workstation and
fabrication software system that is designed to support both TEM sample preparation
and pattern milling.
The FB-2000A can be considered a micro/nano machine shop. The FIB is normally configured
with a TEM-style goniometer specimen introduction system. In the ACMAL facility, we
currently utilize the FIB for two primary functions: TEM sample preparation and line
TEM prep can be carried out in the “in-situ” mode, using a micro-manipulator, where
the partially prepared TEM wedge can be attached to the TEM grid inside the FIB and
the post preparation can begin without removing the specimen.
Line patterning functions are carried out using the fabrication capabilities or the
FIB. The FIB fabrication software facilitates rudimentary CAD drawing or importing
Deposition of tungsten is provided for via software control. Two milling modes and
seven aperture settings, all automated, provide users with high-speed milling or observation
Sample sizes are limited to maxima of 5 mm x 10 mm x 1-2 mm thick for use of the goniometer
sample system. Larger specimens can be accommodated in an SEM stage, although advance
scheduling will be required for use of that stage.