Location
Minerals and Materials Engineering Building (M&M) 432
Contact
Ryan Bischer
989-225-2141
Access Type
Description
The Perkin-Elmer sputtering tool has the ability to have up to three 8” targets loaded at once. The tool uses an RF power source for sputtering and currently has argon, oxygen, and nitrogen gases for reactive sputtering.
Available facilities
- Argon, oxygen, and nitrogen
- Targets: Co, SiO2, SiC, CoTi, AlYt, HfO2, C, Y2O3, W, Co-Zr, Ge, Ti, MoSi2, Al(98%)-Nb(2%), Si-Al, NiFe(19), AlZnO, Cu, Zn, NiFe(17), Ta2O3, Cr, LiO, Mo, Mo-(MoSi2)5.3, FeCo, B3F, Al, Si, Si-(SiN)5, Cu, Ni, and Al2O3
- Dry nitrogen
- Solvents for cleaning samples
- < 4” deposition area with reliable uniformity